Concepedia

Patrick Tinnemans

PT

Statistics

Publications

2

Citations

28

H-Index

2

Active since

2016

Affiliations

IMEC(Current)

ASML (Netherlands)

Patrick Tinnemans is an author at IMEC specializing in manufacturing engineering, alignment metrology, and engineering.

Publications per year

2016–2017

2

Publications

2

Computational scanner wafer mark alignment

Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 16 citations

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Improving scanner wafer alignment performance by target optimization

Philippe Leray, Christiane Jehoul, Robert Socha et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 12 citations

, , +12

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