G.S. May

Advantages of plasma etch modeling using neural networks over statistical techniques

C.D. Himmel, G.S. May · IEEE Transactions on Semiconductor Manufacturing · 1993 · 193 citations

Statistical Techniques, Electrical Engineering, Polysilicon Films +12

An optimal neural network process model for plasma etching

Byungwhan Kim, G.S. May · IEEE Transactions on Semiconductor Manufacturing · 1994 · 109 citations

Engineering, Machine Learning, Neural Networks (Machine Learning) +17

Statistical experimental design in plasma etch modeling

G.S. May, Jia-Hua Huang, Costas J. Spanos · IEEE Transactions on Semiconductor Manufacturing · 1991 · 106 citations

Electrical Engineering, Engineering, Profile Modification +13

Neural network modeling of reactive ion etching using optical emission spectroscopy data

Sang Jeen Hong, G.S. May, Dong-Cheol Park · IEEE Transactions on Semiconductor Manufacturing · 2003 · 89 citations

Neural Network Modeling, Electrical Engineering, Engineering +12

A 60-GHz Active Receiving Switched-Beam Antenna Array With Integrated Butler Matrix and GaAs Amplifiers

Chad E. Patterson, Wasif Tanveer Khan, George E. Ponchak et al. · IEEE Transactions on Microwave Theory and Techniques · 2012 · 80 citations

Lcp Substrate, Millimeter Wave Technology, Engineering +10