B. J. Masters

Self-Diffusion in Intrinsic and Extrinsic Silicon

J. M. Fairfield, B. J. Masters · Journal of Applied Physics · 1967 · 191 citations

Semiconductors, Semiconductor Technology, Silicon Self-diffusion Coefficients +14

Channeling in low energy boron ion implantation

A. E. Michel, R. H. Kastl, Sebastian Mäder et al. · Applied Physics Letters · 1984 · 95 citations

Tilt Angle, Ion Implantation, Engineering +11

Arsenic Isoconcentration Diffusion Studies in Silicon

B. J. Masters, J. M. Fairfield · Journal of Applied Physics · 1969 · 86 citations

Semiconductors, Engineering, Diffusion Resistance +13

Distribution of irradiation damage in silicon bombarded with hydrogen

W. K. Chu, R. H. Kastl, R. F. Lever et al. · Physical review. B, Solid state · 1977 · 78 citations

Depth Measurements, Ion Implantation, Engineering +12

SILICON SELF-DIFFUSION

B. J. Masters, J. M. Fairfield · Applied Physics Letters · 1966 · 78 citations