Publication | Closed Access
Arsenic Isoconcentration Diffusion Studies in Silicon
86
Citations
17
References
1969
Year
SemiconductorsEngineeringDiffusion ResistanceCrystalline DefectsPhysicsNatural SciencesIntrinsic ImpurityApplied PhysicsCondensed Matter PhysicsArsenic Radiotracer DiffusionsSemiconductor MaterialIntrinsic SiliconChemistrySilicon On InsulatorCharge Carrier TransportTracer Diffusion Coefficient
Arsenic radiotracer diffusions have been performed both in intrinsic and in homogeneously doped extrinsic silicon single crystals. Under intrinsic conditions, the tracer diffusion coefficient may be represented by the expression Di=60 exp (−4.20 eV/kT) cm2/sec. Measured in extrinsic silicon, in the absence of a concentration gradient, the tracer diffusion coefficient conforms with the relationship D=Di(n/ni), in which (n/ni) in the ratio of the free electron concentration in the extrinsic sample to that of intrinsic silicon at the diffusion temperature.
| Year | Citations | |
|---|---|---|
Page 1
Page 1