P.F. Hsu

32nm gate-first high-k/metal-gate technology for high performance low power applications

C.H. Diaz, Kenichi Gotō, H.T. Huang et al. · 2008 · 36 citations

Engineering, Electrical Engineering, Low-power Design +10

Single event effects and total ionizing dose results of a low voltage EEPROM

D. Krawzsenek, P.F. Hsu, Hal Anthony et al. · 2002 · 27 citations

Engineering, Electrical Engineering, Low-power Design +10

High performance tantalum carbide metal gate stacks for nMOSFET application

Yunfei Hou, Fan-Yu Yen, P.F. Hsu et al. · 2006 · 24 citations

Engineering, Electrical Engineering, Materials Science +17

Strain effect and channel length dependence of bias temperature instability on complementary metal-oxide-semiconductor field effect transistors with high-k/SiO2 gate stacks

Jen-Chieh Liao, Yuanxing Fang, Y.T. Hou et al. · Applied Physics Letters · 2008 · 19 citations

Engineering, Electrical Engineering, Materials Science +17

Advanced Dual Metal Gate MOSFETs with High-k Dielectric for CMOS Application

P.F. Hsu, Jian-Yuan Chiou, Kai Yin et al. · 2006 · 16 citations

Engineering, Electrical Engineering, Materials Science +17