Concepedia

N. Hirashita

NH

Statistics

Publications

32

Citations

909

H-Index

18

Active since

1981

Affiliations

The University of Tokyo(Current)

Oki Electric Industry (Japan)

Toshiba (Japan)

Semiconductor Energy Laboratory (Japan)

N. Hirashita is an author at The University of Tokyo specializing in engineering, applied physics, and electrical engineering.

Top concepts

EngineeringApplied PhysicsElectrical EngineeringMaterial ScienceMicroelectronicsNanoelectronicsSurface ScienceThin FilmsCrystalline DefectsChemistry

Publications per year

1981–2016

32

Publications

32

Effects of surface hydrogen on the air oxidation at room temperature of HF-treated Si (100) surfaces

N. Hirashita, Makio Kinoshita, I. Aikawa et al. · Applied Physics Letters · 1990 · 123 citations

Engineering, Surface Hydrogen, Oxidation Resistance +17

Channel structure design, fabrication and carrier transport properties of strained-Si/SiGe-on-insulator (strained-SOI) MOSFETs

Shinichi Takagi, Tomohisa Mizuno, Tetsuo Tezuka et al. · 2004 · 88 citations

Electrical Engineering, Channel Engineering, Engineering +11

Chemistry and band offsets of HfO2 thin films for gate insulators

M. Oshima, Satoshi Toyoda, Taiga Okumura et al. · Applied Physics Letters · 2003 · 72 citations

Engineering, Optoelectronic Devices, Chemistry +19

Chemistry and band offsets of HfO2 thin films on Si revealed by photoelectron spectroscopy and x-ray absorption spectroscopy

Satoshi Toyoda, Jun Okabayashi, Hiroshi Kumigashira et al. · Journal of Electron Spectroscopy and Related Phenomena · 2004 · 50 citations

Materials Science, Ii-vi Semiconductor, Engineering +10

Electrical properties of Si films doped with 200-eV In+ ions during growth by molecular-beam epitaxy

J.-P. Noël, N. Hirashita, L. C. Markert et al. · Journal of Applied Physics · 1989 · 45 citations

Si Films, Engineering, Optoelectronic Devices +17

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