Concepedia

Chemistry and band offsets of HfO2 thin films on Si revealed by photoelectron spectroscopy and x-ray absorption spectroscopy

Satoshi Toyoda, Jun Okabayashi, Hiroshi Kumigashira, M. Oshima, Kanta Ono, M. Niwa, Koji Usuda, N. Hirashita

Journal of Electron Spectroscopy and Related Phenomena · 2004 · 52 citations · 15 references

DOI

Concepts

References

15

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

, , +17

Band offsets of wide-band-gap oxides and implications for future electronic devices

John Robertson · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 2K citations

, , +17

Alternative dielectrics to silicon dioxide for memory and logic devices

Angus I. Kingon, Jon‐Paul Maria, S. K. Streiffer · Nature · 2000 · 1.3K citations

, , +14

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing

Byoung Hun Lee, Laegu Kang, R. Nieh et al. · Applied Physics Letters · 2000 · 606 citations

, , +17

Calculation of electron inelastic mean free paths (IMFPs) VII. Reliability of the TPP‐2M IMFP predictive equation

Shigeo Tanuma, C. J. Powell, David R. Penn · Surface and Interface Analysis · 2003 · 467 citations

, , +14