Positive-temperature-coefficient effect of electrical resistivity below melting point of poly(vinylidene fluoride) (PVDF) in Ni particle-dispersed PVDF composites

Akihiko Kono, Katsuya Shimizu, Hajime Nakano, +4

Polymer

Materials ScienceVinylidene FluorideElectrical EngineeringPolymer MaterialEngineering +7

A high-speed photoresist removal process using multibubble microwave plasma under a mixture of multiphase plasma environment

Tatsuo Ishijima, Kohei Nosaka, Yasunori Tanaka, +3

Applied Physics Letters

Materials SciencePhotoresist FilmPhotoresist Removal ProcessEngineeringPhotochemistry +10

Fluorine-graphite HOPG intercalation compounds

Hidekazu Touhara, Yousuke Goto, Nobuatsu Watanabe, +4

Synthetic Metals

Materials ScienceEngineeringFluorous SynthesisGrapheneChemistry +2

Removal of Ion-Implanted Photoresists Using Atomic Hydrogen

Masashi Yamamoto, Takeshi Maruoka, Yousuke Goto, +6

Journal of The Electrochemical Society

EngineeringAcceleration EnergyPhoto-electrochemical CellChemistryIon Implantation +14

Relationship between the Thermal Hardening of Ion-Implanted Resist and the Resist Removal Using Atomic Hydrogen

Takeshi Maruoka, Yousuke Goto, Masashi Yamamoto, +4

Journal of Photopolymer Science and Technology

Materials EngineeringMaterials ScienceElectrical EngineeringIon ImplantationEngineering +12

Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water

Hideo Horibe, Masashi Yamamoto, Yousuke Goto, +2

Japanese Journal of Applied Physics

Advanced Oxidation ProcessEngineeringGreen ChemistryWet OzoneChemistry +14

Effect of cooling rate after polymer melting on electrical properties of high-density polyethylene/Ni composites

Akihiko Kono, Naoko Miyakawa, Satoshi Kawadai, +4

Polymer Journal

Materials ScienceElectrical EngineeringEngineeringHigh-density Polyethylene/ni CompositesPolymer Science +9

Removal of Ion-Implanted Photoresists Using Wet Ozone

Masashi Yamamoto, Yousuke Goto, Takeshi Maruoka, +4

Journal of The Electrochemical Society

EngineeringWet OzoneChemistryChemical EngineeringIon-implanted Photoresists +15

Removal of Polymers with Various Chemical Structures using Wet Ozone

Yousuke Goto, K. Kitano, Takeshi Maruoka, +4

Journal of Photopolymer Science and Technology

Advanced Oxidation ProcessEngineeringWet OzoneOrganic ChemistryChemistry +15

Ion-implanted resist removal using atomic hydrogen

Hideo Horibe, Masashi Yamamoto, Takeshi Maruoka, +4

Thin Solid Films

Chemical EngineeringIon ImplantationEngineeringIon-implanted Resist RemovalHydrogen +3