Concepedia

Chuan Lin

CL

Statistics

Publications

3

Citations

69

H-Index

3

Active since

1997

Affiliations

IBM (United States)(Current)

Chuan Lin is an author at IBM (United States) specializing in gate oxide degradation, semiconductor reliability, and device reliability.

Publications per year

1997–2002

3

Publications

3

Optimization of sub 3 nm gate dielectrics grown by rapid thermal oxidation in a nitric oxide ambient

Kiran Kumar, A. Chou, Chuan Lin et al. · Applied Physics Letters · 1997 · 29 citations

, , +15

Detection of thin oxide (3.5 nm) dielectric degradation due to charging damage by rapid-ramp breakdown

Terence B. Hook, D. L. Harmon, Chuan Lin · 2002 · 22 citations

, , +17

Plasma process-induced damage on thick (6.8 nm) and thin (3.5 nm) gate oxide: parametric shifts, hot-carrier response, and dielectric integrity degradation

Terence B. Hook, D. L. Harmon, Chuan Lin · Microelectronics Reliability · 2001 · 18 citations

, , +17

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