Dapeng Chen

Application of Atomic Layer Deposition Tungsten (ALD W) as Gate Filling Metal for 22 nm and Beyond Nodes CMOS Technology

Guilei Wang, Qiang Xu, Tao Yang et al. · ECS Journal of Solid State Science and Technology · 2014 · 39 citations

Engineering, Materials Engineering, Materials Science +17

Improved Short Channel Effect Control in Bulk FinFETs With Vertical Implantation to Form Self-Aligned Halo and Punch-Through Stop Pocket

Miao Xu, Huilong Zhu, Lichuan Zhao et al. · IEEE Electron Device Letters · 2015 · 34 citations

Engineering, Materials Engineering, Low-power Design +10

A novel uncooled substrate-free optical-readable infrared detector: design, fabrication and performance

Chaobo Li, Binbin Jiao, Shali Shi et al. · Measurement Science and Technology · 2006 · 29 citations

Engineering, Materials Engineering, Materials Science +17

Study of SiGe selective epitaxial process integration with high-k and metal gate for 16/14nm nodes FinFET technology

Guilei Wang, Changliang Qin, Huaxiang Yin et al. · Microelectronic Engineering · 2016 · 26 citations

Engineering, Electrical Engineering, Materials Science +16

Impact of Ge Preamorphization Implantation on Both the Formation of Ultrathin TiSi_{<italic>x</italic>} and the Specific Contact Resistivity in TiSi_{<italic>x</italic>}/n-Si Contacts

Shujuan Mao, Guilei Wang, Jing Xu et al. · IEEE Transactions on Electron Devices · 2018 · 24 citations

Engineering, Materials Engineering, Materials Science +16