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Study of SiGe selective epitaxial process integration with high-k and metal gate for 16/14nm nodes FinFET technology

DOI

25

Citations

16

References

2016

Year

Guilei Wang, Changliang Qin, Huaxiang Yin, Jun Luo, Ningyuan Duan, Ping Yang, Xingyu Gao, Tao Yang, Junfeng Li, Yan Jiang,
Microelectronic Engineering

References

YearCitations

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