Effectiveness of reverse body bias for leakage control in scaled dual Vt CMOS ICs

A. Keshavarzi, Shuo Ma, S. Narendra, +5

Low-power ElectronicsHardware SecurityElectrical EngineeringPhysical Design (Electronics)Engineering +12

Tailoring the topology of an artificial magnetic skyrmion

J. Li, A. Tan, Kyoung‐Woong Moon, +8

Nature Communications

SpintronicsMagnetismArtificial Magnetic SkyrmionEngineeringMajorana Fermion +8

Advancing 2D Monolayer CMOS Through Contact, Channel and Interface Engineering

Kevin P. O’Brien, C. J. Dorow, Ashish Verma Penumatcha, +15

2021 IEEE International Electron Devices Meeting (IEDM)

EngineeringTransition Metal DichalcogenideOptoelectronic DevicesSemiconductorsIi-vi Semiconductor +18

A 32nm SoC platform technology with 2<sup>nd</sup> generation high-k/metal gate transistors optimized for ultra low power, high performance, and high density product applications

C.-H. Jan, M. Agostinelli, Markus J. Buehler, +41

EngineeringVlsi DesignComputer ArchitectureIntegrated CircuitsHigh Performance +18

Autoclave grid-to-rod fretting corrosion behaviors of the Zr alloy fuel cladding with and without Cr coating through advanced characterization

Yahuan Zhao, Yaxiong Bai, Jie Yang, +12

Corrosion Science

Materials EngineeringMaterials ScienceAdvanced CharacterizationCorrosion ProtectionEngineering +7

Achieving superior mechanical performance in FeCrAl alloys through serrated and pinning-enhanced grain boundaries

Kun Zhang, Shuo Ma, Zhao Shen, +4

Journal of Materials Research and Technology

Effectiveness of reverse body bias for leakage control in scaled dual Vt CMOS ICs

A. Keshavarzi, Shuo Ma, S. Narendra, +5

Low-power ElectronicsEngineeringVlsi DesignMixed-signal Integrated CircuitArticle Share +8

High-throughput screening of microchip-synthesized genes in programmable double-emulsion droplets

Hon Fai Chan, Shuo Ma, Jiajun Tian, +1

Nanoscale

EngineeringEscherichia ColiBiofabricationOrgan-on-a-chipBiomedical Engineering +14

A 45nm NOR Flash Technology with Self-Aligned Contacts and 0.024μm² Cell Size for Multi-level Applications

R. Fastow, Rajat Banerjee, P. Bjeletich, +10

Multi-level ApplicationsMiniaturizationEngineeringElectron-beam LithographyIntegrated Circuits +20

Tailoring the magnetic anisotropy of Py/Ni bilayer films using well aligned atomic steps on Cu(001)

Shuo Ma, A. Tan, Jiangxia Deng, +4

Scientific Reports