Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

Sang Woon Lee, Oh Seong Kwon, Jeong Hwan Han, +1

Applied Physics Letters

Non-volatile MemoryEngineeringEmerging Memory TechnologySr PrecursorsHalide Perovskites +16

Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

Wan Don Kim, Gyu Weon Hwang, Oh Seong Kwon, +7

Journal of The Electrochemical Society

Growth CharacteristicsIncubation PeriodEngineeringPhase Change MemoryEpitaxial Growth +15

Chemically Conformal ALD of SrTiO[sub 3] Thin Films Using Conventional Metallorganic Precursors

Oh Seong Kwon, Seong Keun Kim, Moonju Cho, +2

Journal of The Electrochemical Society

Conformal AldEngineeringThin Film Process TechnologyChemistryChemical Deposition +16

Atomic Layer Deposition and Electrical Properties of SrTiO[sub 3] Thin Films Grown Using Sr(C[sub 11]H[sub 19]O[sub 2])[sub 2], Ti(Oi-C[sub 3]H[sub 7])[sub 4], and H[sub 2]O

Oh Seong Kwon, Sang Woon Lee, Jeong Hwan Han, +1

Journal of The Electrochemical Society

Materials ScienceMaterials EngineeringChemical EngineeringSub 2Remote Plasma +13

Influences of a Crystalline Seed Layer during Atomic Layer Deposition of SrTiO[sub 3] Thin Films Using Ti(O-iPr)[sub 2](thd)[sub 2], Sr(thd)[sub 2], and H[sub 2]O

Sang Woon Lee, Jeong Hwan Han, Oh Seong Kwon, +1

Journal of The Electrochemical Society

EngineeringCrystal Growth TechnologyChemical DepositionSeed-layer ThicknessChemical Engineering +14

Structurally and Electrically Uniform Deposition of High-k TiO[sub 2] Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer Deposition

Seong Keun Kim, Kyung‐Min Kim, Oh Seong Kwon, +5

Electrochemical and Solid-State Letters

EngineeringChemical DepositionNanoelectronicsAld Ru ElectrodeRutile Structure +14

Metalorganic chemical vapor deposition of very thin Pb(Zr,Ti)O₃ thin films at low temperatures for high-density ferroelectric memory applications

Hye Ryoung Kim, Seehwa Jeong, Chung Bae Jeon, +5

Journal of materials research/Pratt's guide to venture capital sources

Materials ScienceThin PbLow TemperaturesEngineeringFerroelectric Application +7

Protection of SrBi2Ta2O9 ferroelectric capacitors from hydrogen damage by optimized metallization for memory applications

Suk-Kyoung Hong, Chung Won Suh, Chang Goo Lee, +5

Applied Physics Letters

EngineeringElectrode-electrolyte InterfaceChemistrySmall Size CapacitorsPhase Change Memory +15

Degradation behavior in the remnant polarization of SrBi2Ta2O9 thin films by hydrogen annealing and its recovery by postannealing

Oh Seong Kwon, Cheol Seong Hwang, Suk-Kyoung Hong

Applied Physics Letters

Materials ScienceMaterials EngineeringMaterial AnalysisEngineeringHydrogen Annealing +7

Polarity-dependent rejuvenation of ferroelectric properties of integrated SrBi2Ta2O9 capacitors by electrical stressing

Suk-Kyoung Hong, Cheol Seong Hwang, Oh Seong Kwon, +1

Applied Physics Letters

Materials ScienceElectrical EngineeringElectrical StressingEngineeringFerroelastics +11