Moonju Cho

Chemical structure of the interface in ultrathin HfO2/Si films

Jong‐Cheol Lee, Sangyoon Oh, Moonju Cho et al. · Applied Physics Letters · 2004 · 130 citations

Natural Sciences, Materials Science, Physics +17

Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant

Hong Bae Park, Moonju Cho, Jaehoo Park et al. · Journal of Applied Physics · 2003 · 120 citations

Natural Sciences, Materials Engineering, Materials Science +17

Chemical interaction between atomic-layer-deposited HfO2 thin films and the Si substrate

Moonju Cho, Jaehoo Park, Hong Bae Park et al. · Applied Physics Letters · 2002 · 114 citations

Natural Sciences, Materials Engineering, Materials Science +17

SiGe Channel Technology: Superior Reliability Toward Ultrathin EOT Devices—Part I: NBTI

J. Franco, B. Kaczer, Philippe Roussel et al. · IEEE Transactions on Electron Devices · 2012 · 103 citations

Engineering, Electrical Engineering, Materials Science +17

Interfacial reaction between chemically vapor-deposited HfO2 thin films and a HF-cleaned Si substrate during film growth and postannealing

Byoung Keon Park, Jaehoo Park, Moonju Cho et al. · Applied Physics Letters · 2002 · 98 citations

Natural Sciences, Materials Engineering, Materials Science +17