Jeong Hwan Han

Al‐Doped TiO₂ Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

Seong Keun Kim, Gyu‐Jin Choi, Sang‐Young Lee et al. · Advanced Materials · 2008 · 317 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

Seong Keun Kim, Sang Woon Lee, Jeong Hwan Han et al. · Advanced Functional Materials · 2010 · 229 citations

Non-volatile Memory, Engineering, Emerging Memory Technology +17

Highly Improved Uniformity in the Resistive Switching Parameters of TiO₂ Thin Films by Inserting Ru Nanodots

Jung Ho Yoon, Jeong Hwan Han, Ji Sim Jung et al. · Advanced Materials · 2013 · 181 citations

Non-volatile Memory, Engineering, Thin Film Process Technology +17

Atomic Layer Deposition of SrTiO₃ Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

Sang Woon Lee, Jeong Hwan Han, Sora Han et al. · Chemistry of Materials · 2011 · 134 citations

Engineering, Emerging Memory Technology, Thin Film Process Technology +16

Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

Sang Woon Lee, Oh Seong Kwon, Jeong Hwan Han et al. · Applied Physics Letters · 2008 · 120 citations

Non-volatile Memory, Engineering, Emerging Memory Technology +18