Ch. Lohe

Microscopic model for the nonlinear behavior of high-k metal-insulator-metal capacitors

Christian Wenger, Mindaugas Lukosius, O. Seifarth et al. · Journal of Applied Physics · 2008 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +17

The role of the HfO2–TiN interface in capacitance–voltage nonlinearity of Metal-Insulator-Metal capacitors

Christian Wenger, Mindaugas Lukosius, G. Weidner et al. · Thin Solid Films · 2009 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +16

Influence of the electrode material on HfO2 metal-insulator-metal capacitors

Christian Wenger, Mindaugas Lukosius, H.‐J. Müssig et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +17

Investigation of atomic vapour deposited TiN/HfO2/SiO2 gate stacks for MOSFET devices

Christian Wenger, Mindaugas Lukosius, Ioan Costina et al. · Microelectronic Engineering · 2008 · 30 citations

Engineering, Electrical Engineering, Materials Science +16

Atomic - vapour - deposited HfO2 and Sr4Ta2O9 layers for metal-insulator-metal applications

Mindaugas Lukosius, Christian Wenger, Thomas Schroeder et al. · Microelectronic Engineering · 2007 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +12