Toshikazu Shimada - Concepedia

Author

Toshikazu Shimada

Hitachi (Japan)

Also Known As

Toshikazu SHIMADA, Toshikazu Shimada, Toshikazu Shimada Toshikazu Shimada

Publications

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)Tokyo University of Agriculture and Technology Tokyo Institute of Technology The University of Tokyo Japan Science and Technology Agency

About

Toshikazu Shimada is an author at Hitachi (Japan) specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Applied Physics	20	25	817
2	Engineering	19	24	797
3	Chemistry	3	3	244
4	Natural Sciences	2	2	95
5	Health Sciences	1	1	18

Toshikazu Shimada

Publications

837

Citations

H-Index

Page 1

	Year	Citations
Chemical bonding states in the amorphous Si<sub>x</sub>C<sub>1–x</sub>: H system studied by X-ray photoemission spectroscopy and infrared absorption spectra Yoshifumi Katayama, Katsuhisa Usami, Toshikazu Shimada Philosophical Magazine B H Alloy SystemEngineeringSolid-state ChemistryThin Film Process TechnologyChemistry	1981	147
Infrared Spectra of Amorphous Silicon-Fluorine Alloys Prepared by Sputtering in Fluorosilane-Argon Gas Mixture Toshikazu Shimada, Yoshifumi Katayama, Shinkichi Horigome Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringOptical MaterialsEngineeringOptical Properties	1980	69
Optical studies of deep-center luminescence in CdS Y. Shiraki, Toshikazu Shimada, K. F. Komatsubara Journal of Applied Physics Optical MaterialsEngineeringOptoelectronic DevicesLuminescence PropertySemiconductors	1974	51
Behavior of Plasmons in an Amorphous Silicon-Carbon Alloy System Studied by X-Ray Photoelectron Spectroscopy Yoshifumi Katayama, Toshikazu Shimada, Katsuhisa Usami Physical Review Letters Materials SciencePlasmonicsEngineeringPhysicsCrystalline Defects	1981	50
Nanoelectromechanical nonvolatile memory device incorporating nanocrystalline Si dots Yoshishige Tsuchiya, Kosuke Takai, N. Momo, Journal of Applied Physics Finite Element MethodElectrical EngineeringNc-si DotsEngineeringNon-volatile Memory	2006	46
Microstructure of Visible Light Emitting Porous Silicon Akio Nishida, Kiyokazu Nakagawa, Hiroshi Kakibayashi, Japanese Journal of Applied Physics Materials ScienceQuantum BoxesPhotoluminescenceEngineeringNanoporous Material	1992	40
Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma Takeshi Watanabe, Masahiro Tanaka, Kazufumi Azuma, Japanese Journal of Applied Physics EngineeringAmorphous Silicon-germanium FilmsOptoelectronic DevicesThin Film Process TechnologyChemical Deposition	1987	38
Fine Structure of Porous Si with Visible Photoluminescence Kiyokazu Nakagawa, Akio Nishida, Toshikazu Shimada, Japanese Journal of Applied Physics Materials ScienceNanoscale SciencePhotoluminescenceEngineeringNanoporous Material	1992	28
Gap States in a-SiGe:H Examined by the Constant Photocurrent Method Takeshi Watanabe, Kazufumi Azuma, Mitsuo Nakatani, Japanese Journal of Applied Physics EngineeringDefect ToleranceElectronic StructureIi-vi SemiconductorElectron Spectroscopy	1990	26
Preparation and properties of microcrystalline silicon films using photochemical vapor deposition Tadashi Saitoh, Toshikazu Shimada, M. Migitaka, Journal of Non-Crystalline Solids Materials ScienceEngineeringPhotochemical Vapor DepositionMicrofabricationSilicon On Insulator	1983	26

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