Publication | Closed Access
Chemical bonding states in the amorphous Si<sub>x</sub>C<sub>1–x</sub>: H system studied by X-ray photoemission spectroscopy and infrared absorption spectra
147
Citations
10
References
1981
Year
H Alloy SystemEngineeringSolid-state ChemistryThin Film Process TechnologyChemistryH SystemSi 2PX-ray Photoemission SpectroscopyThin Film ProcessingInfrared Absorption SpectraMaterials SciencePhysical ChemistryCore ElectronsSemiconductor MaterialSurface ScienceApplied PhysicsCondensed Matter PhysicsThin FilmsAmorphous Solid
Abstract XPS studies and infrared absorption measurements of the reactively sputtered (RS) amorphous SixC1–x: H alloy system have been made. The binding energy of the Si 2p core electrons decreases monotonically as the alloy composition x increases while the corresponding line-width remains almost constant. On the other hand, a curve of the C 1s core electron binding energy versus x has a kink at around x = 0·5∼0·6. Infrared absorption spectra reveal the existence of C–H, Si–H, Si–C bonds in the films. These results are discussed in terms of chemical bonding states.
| Year | Citations | |
|---|---|---|
Page 1
Page 1