Infrared Spectra of Amorphous Silicon-Fluorine Alloys Prepared by Sputtering in Fluorosilane-Argon Gas Mixture

Abstract

Infrared spectra of amorphous Si : F alloys prepared by sputtering of a silicon crystal in SiF 4 or a mixture of SiF 4 +Ar were measured in the frequency range of 450–4000 cm -1 . Six absorption bands were observed in the 800–1100 cm -1 region. These bands are assigned as the SiF N ( N =1, 2, 3) bond stretching vibration modes by comparison with the infrared spectra of SiF N H 4- N molecules. In addition, fluorine modified or enhanced Si-Si bond stretching modes were observed at 515 and 650 cm -1 .