A dual-metal gate CMOS technology using nitrogen-concentration-controlled TiNx film

Hitoshi Wakabayashi, Y. Saito, Kiyoshi Takeuchi, +2

IEEE Transactions on Electron Devices

Materials ScienceElectrical EngineeringEngineeringNanoelectronicsApplied Physics +7

Electrical Switching in Evaporated Lead Phthalocyanine Films

Yasuhiko Machida, Y. Saito, Akira Taomoto, +3

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringElectrical EngineeringElectrical SwitchingEngineering +12

Memory-State Dependence of Random Telegraph Noise of $ \hbox{Ta}_{2}\hbox{O}_{5}/\hbox{TiO}_{2}$ Stack ReRAM

Masayuki Terai, Yukihiro Sakotsubo, Y. Saito, +2

IEEE Electron Device Letters

Electrical EngineeringEngineeringPhysicsRandom Telegraph NoiseResistance Controllability +5

Low-resistance self-aligned Ti-silicide technology for sub-quarter micron CMOS devices

Tohru Mogami, Hitoshi Wakabayashi, Y. Saito, +3

IEEE Transactions on Electron Devices

Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringMicrofabrication +11

Effect of bottom electrode of ReRAM with Ta<inf>2</inf>O<inf>5</inf>/TiO<inf>2</inf> stack on RTN and retention

Masayuki Terai, Yukihiro Sakotsubo, Y. Saito, +2

Materials ScienceMaterials EngineeringBottom ElectrodeEngineeringPhysics +4

Highly scalable nonvolatile TiOx/TaSiOy solid-electrolyte crossbar switch integrated in local interconnect for low power reconfigurable logic

Munehiro Tada, Toshitsugu Sakamoto, Y. Tsuji, +10

A new approach for improving operating margin of unipolar ReRAM using local minimu m of reset voltage

Yukihiro Sakotsubo, Masayuki Terai, Setsu Kotsuji, +4

Electrical EngineeringPlasma ElectronicsEngineeringProfile ModificationEnergy Efficiency +12

Lead phthalocyanine Langmuir-Blodgett films

Katsuhiro Nichogi, Katsunori Waragai, Akira Taomoto, +2

Thin Solid Films

Materials ScienceEngineeringOrganic ElectronicsApplied PhysicsOrganic Semiconductor +1

A novel W/TiNx metal gate CMOS technology using nitrogen-concentration-controlled TiNx film

Hitoshi Wakabayashi, Y. Saito, Kiyoshi Takeuchi, +2

Nitrogen ConcentrationElectrical EngineeringEngineeringNanoelectronicsTin Film +9

Evaluation of nanostructure and properties of aluminum phthalocyanine chloride thin films due to ethanol-vapor treatment

Keizo Kato, Y. Saito, Yasuo Ohdaira, +2

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringSurface ScienceChemistry +4