Yoshihiro Tezuka - Concepedia

Author

Yoshihiro Tezuka

National Institute of Advanced Industrial Science and Technology

Also Known As

Yoshihiro TEZUKA, Yoshihiro Tezuka

Publications

310

Citations

H-Index

Concepts

All Affiliations

National Institute of Advanced Industrial Science and Technology Association of Super-Advanced Electronics Intel (United States)The University of Tokyo Mirai Hospital

About

Yoshihiro Tezuka is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, applied physics, and instrumentation.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	228
2	Applied Physics	8	8	186
3	Medicine	4	4	79
4	Health Sciences	1	1	30
5	Natural Sciences	1	1	37

Yoshihiro Tezuka

Publications

253

Citations

H-Index

Page 1

	Year	Citations
Simultaneous angle-resolved measurement of the band structure of single-crystal graphite by an improved two-dimensional display analyzer Hiroyuki Nishimoto, Hiroshi Daimon, S. Suga, Review of Scientific Instruments Optical MaterialsEngineeringMicroscopyElectron DiffractionOptical Characterization	1993	37
Surface electronic structure of ordered alkali- and noble metal-overlayers on Si(111) Taichi Okuda, Hiroshi Daimon, S. Suga, Applied Surface Science Materials ScienceSurface CharacterizationEngineeringSurface ChemistrySurface Analysis	1997	32
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements Kenneth A. Goldberg, Anton Barty, Yanwei Liu, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightShort Wavelength OpticMask Inspection ToolsEngineeringElectron-beam Lithography	2006	30
High-speed actinic EUV mask blank inspection with dark-field imaging Tsuneo Terasawa, Yoshihiro Tezuka, Masaaki Ito, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringMicroscopyOptical TestingImage SensorInspection Time	2004	30
Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMicroscopyOptical Testing	2004	21
Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source Toshihisa Tomie, Tsuneo Terasawa, Yoshihiro Tezuka, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringMicroscopyOptic DesignMultilayer MaskOptical Testing	2003	21
Sensitivity-Limiting Factors of at-Wavelength Extreme Ultraviolet Lithography Mask Blank Inspection Yoshihiro Tezuka, Toshihiko Tanaka, Tsuneo Terasawa, Japanese Journal of Applied Physics Optical EngineeringExtreme Uv LithographyEngineeringElectron-beam LithographyOphthalmology	2006	17
Actinic detection and signal characterization of multilayer defects on EUV mask blanks Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Afm MeasurementsEngineeringMicroscopyOptical TestingMultilayer Defects	2004	17
Mask data processing in the era of multibeam writers Frank E. Abboud, Michael Asturias, Maesh Chandramouli, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2014	15
EUV mask infrastructure and actinic pattern mask inspection Ted Liang, Yoshihiro Tezuka, Marieke F. Jager, EngineeringInspectionPattern ScalingElectron-beam LithographyBiometrics	2020	12

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