Philippe Bézard

Development of plasma etching processes to pattern sub-15 nm features with PS-<i>b</i>-PMMA block copolymer masks: Application to advanced CMOS technology

Michaël Delalande, Gilles Cunge, T. Chevolleau et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2014 · 18 citations · Full text

Engineering, Electron-beam Lithography, Pattern Transfer +23

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

Gwenaelle Pound-Lana, Philippe Bézard, Camille Petit‐Etienne et al. · ACS Applied Materials & Interfaces · 2021 · 16 citations · Full text

Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana et al. · ACS Applied Materials & Interfaces · 2021 · 12 citations · Full text

Engineering, Molecular Self-assembly, Nanostructured Polymer +18

Material and process optimization for EUV pattern rectification by DSA

Lander Verstraete, Hyo Seon Suh, Julie Van Bel et al. · 2024 · 11 citations