Polymer self assembly in semiconductor microelectronics

Charles T. Black, Ricardo Ruiz, Greg Breyta, +5

IBM Journal of Research and Development

EngineeringMolecular Self-assemblyIntegrated CircuitsPolymersSemiconductors +18

Experimental Implementation of an Adiabatic Quantum Optimization Algorithm

Matthias Steffen, Wim van Dam, Tad Hogg, +2

Physical Review Letters

Experimental ImplementationQuantum ScienceEngineeringQuantum ComputingPhysics +12

Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.

Hiroshi Itô, Greg Breyta, Don Hofer, +3

Journal of Photopolymer Science and Technology

Highly porous silicon membrane fabrication using polymer self-assembly

Charles T. Black, K.W. Guarini, Greg Breyta, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceMembrane StructureMembrane FormationEngineeringFlexible Electronics +13

Development of 157 nm positive resists

Hiroshi Itô, G. M. Wallraff, Nicolette Fender, +7

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringOrganic ChemistryChemistryPolymersChemical Engineering +22

Novel Fluoropolymers for Use in 157nm Lithography.

Hiroshi Itô, G. M. Wallraff, Nicolette Fender, +7

Journal of Photopolymer Science and Technology

EngineeringElectron-beam LithographyResponsive PolymersChemistryPolymers +21

Single-layer chemically amplified photoresists for 193-nm lithography

G. M. Wallraff, Robert D. Allen, William D. Hinsberg, +6

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyLaser ApplicationsLaser Exposure Tools +15

Dissolution Kinetics and PAG Interaction of Phenolic Resins in Chemically Amplified Resists.

Hiroshi Itô, Debra-Fenzel Alexander, Greg Breyta

Journal of Photopolymer Science and Technology

Materials ScienceChemical EngineeringChemically Amplified ResistsDissolution BehaviorDissolution Inhibition Effect +10

Progress in 193 nm Positive Resists.

Robert D. Allen, Ratnam Sooriyakumaran, Juliann Opitz, +7

Journal of Photopolymer Science and Technology

Materials ScienceEngineeringSpecific ResistancePhotochemistry193-Nm Resists +11

Monomer Reactivities and Kinetics in Radical Copolymerization of Hydroxystyrene Derivatives and <i>tert</i>-Butyl (Meth)acrylate

Hiroshi Itô, Charlie Dalby, Andrew E. Pomerantz, +5

Macromolecules

Chemical KineticsEngineeringOrganic ChemistryMonomer Reactivity RatiosChemistry +14