Gregory F. Cardinale

Author

Sandia National Laboratories California

Also Known As

Gregory F. Cardinale

Publications

419

Citations

H-Index

Concepts

All Affiliations

Sandia National Laboratories California Intel (United States)Lawrence Livermore National Laboratory Motorola (United States)University of California, Davis

About

Gregory F. Cardinale is an author at Sandia National Laboratories California specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Applied Physics	9	9	393
2	Engineering	8	8	137
3	Medicine	1	1	21
4	Computer Science	1	1	14
5	Electrical Engineering	1	1	14

Gregory F. Cardinale

Publications

393

Citations

H-Index

Page 1

	Year	Citations
Young's modulus and Poisson's ratio of CVD diamond Claude Klein, Gregory F. Cardinale Diamond and Related Materials Diamond-like CarbonPhysicsApplied PhysicsModulus ProblemCvd Diamond	1993	256
<title>Photoresist film thickness for extreme ultraviolet lithography</title> Paul M. Dentinger, Gregory F. Cardinale, Craig C. Henderson, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesThin Film Process Technology	2000	27
Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists Charlotte Cutler, Joseph F. Mackevich, Jieming Li, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials SciencePolymer MaterialEngineeringBeam LithographyPolymer Science	2003	21
Sub-100-nm lithographic imaging with an EUV 10X microstepper J. E. M. Goldsmith, Kurt W. Berger, Dan R. Bozman, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical EngineeringEngineeringElectron-beam LithographyMicroscopySpace Optic	1999	21
Top-surface imaging resists for EUV lithography Craig C. Henderson, David R. Wheeler, Tim P. Pollagi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticEngineeringElectron-beam LithographyMicroscopyExtreme Uv	1998	15
<title>EUV mask fabrication with Cr absorber</title> Pawitter J. S. Mangat, Scott D. Hector, Stewart Rose, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Materials EngineeringMaterials ScienceElectrical EngineeringPeak ReflectivityEngineering	2000	14
EUV mask patterning approaches Pei-yang Yan, Guojing Zhang, Patrick Kofron, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyBiometricsWafer Scale ProcessingImage Analysis	1999	14
<title>Young's modulus and Poisson's ratio of CVD diamond</title> Claude Klein, Gregory F. Cardinale Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Mineral PhysicEngineeringCvd Diamond DepositsMechanical EngineeringBulge Test Method	1992	13
Masks for extreme ultraviolet lithography S. P. Vernon, Patrick A. Kearney, William M. Tong, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Ultraviolet LightOptical MaterialsEngineeringElectron-beam LithographyLaser Applications	1998	12

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