Nick Stacey

Study of the kinetics of step and flash imprint lithography photopolymerization

Michael D. Dickey, Ryan L. Burns, E. K. Kim et al. · AIChE Journal · 2005 · 41 citations

Engineering, Responsive Polymers, Polymers +18

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Mike Miller, Gary Doyle, Nick Stacey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 24 citations

Engineering, Pattern Transfer, Nano-imprint Lithography +18

Toward 22 nm for unit process development using step and flash imprint lithography

Gerard M. Schmid, Ecron Thompson, Nick Stacey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 19 citations

Engineering, Electron-beam Lithography, Wafer Scale Processing +17

Template fabrication for the 32nm node and beyond

Gerard M. Schmid, Ecron Thompson, Nick Stacey et al. · Microelectronic Engineering · 2007 · 15 citations

Engineering, Microfabrication, Digital Fabrication +6