Gary Doyle

Progress in mask replication using jet and flash imprint lithography

Kosta Selinidis, Cynthia B. Brooks, Gary Doyle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 33 citations

Engineering, Electron-beam Lithography, Pattern Transfer +16

Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Mike Miller, Gary Doyle, Nick Stacey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 24 citations

Engineering, Pattern Transfer, Nano-imprint Lithography +18

Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning

David L. Lentz, Gary Doyle, Mike Miller et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 16 citations

Engineering, Pattern Transfer, Micromanufacturing +20

Step and flash imprint lithography template fabrication for emerging market applications

Douglas J. Resnick, Gerard M. Schmid, Mike Miller et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 12 citations

Optical Materials, Engineering, Electron-beam Lithography +19