S. Iijima

Hexagonal polymorph of tantalum–pentoxide with enhanced dielectric constant

Masahiko Hiratani, S. Kimura, Tomoyuki Hamada et al. · Applied Physics Letters · 2002 · 52 citations

Natural Sciences, Materials Science, Physics +17

0.1 mu m CMOS devices using low-impurity-channel transistors (LICT)

Masashi Aoki, Tatsuya Ishii, Teizo Yoshimura et al. · 2002 · 44 citations

Engineering, Computer Engineering, Electrical Engineering +13

Design and performance of 0.1- mu m CMOS devices using low-impurity-channel transistors (LICT's)

Masakazu Aoki, Tatsuya Ishii, Teizo Yoshimura et al. · IEEE Electron Device Letters · 1992 · 41 citations

Engineering, Computer Engineering, Electrical Engineering +17

The Study of Ultrathin Tantalum Oxide Films before and after Annealing with X-Ray Photoelectron Spectroscopy

Akiko Muto, Fumiko Yano, Yasuhiro Sugawara Yasuhiro Sugawara et al. · Japanese Journal of Applied Physics · 1994 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reduction of current leakage in chemical-vapor deposited Ta₂O₅ thin-films by oxygen-radical annealing [DRAM dielectric]

Y. Matsui, Kazuyoshi Torii, Masaki Hirayama et al. · IEEE Electron Device Letters · 1996 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +17