Concepedia

Toshiki Kaneko

TK

3

Publications

204

Citations

3

H-Index

1992

Active since

Affiliations

Hitachi (Japan)(Current)

Toshiki Kaneko is an author at Hitachi (Japan) specializing in applied physics, thin films, and engineering.

Top concepts

Thin FilmsEngineeringApplied PhysicsMaterial ScienceSurface ScienceChemistryNanotechnologyNanoelectronicsMicroelectronicsMicrofabrication

Publications per year

1992–1994

3

Publications

3

Change in crystalline morphologies of polycrystalline silicon films prepared by radio-frequency plasma-enhanced chemical vapor deposition using SiF4+H2 gas mixture at 350 °C

Toshiki Kaneko, Masatoshi Wakagi, Ken‐ichi Onisawa et al. · Applied Physics Letters · 1994 · 127 citations

Materials Science, Engineering, Crystalline Morphologies +11

Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow

Toshiki Kaneko, Ken‐ichi Onisawa, Masatoshi Wakagi et al. · Japanese Journal of Applied Physics · 1993 · 61 citations

Si Films, Engineering, Chemistry +17

Crystallinity Analysis of Amorphous-Crystalline Mixed Phase Silicon films Using Exafs Method

Masatoshi Wakagi, Toshiki Kaneko, Kiyoshi Ogata et al. · MRS Proceedings · 1992 · 16 citations

Materials Science, Exafs Method, Material Analysis +7

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