Kiyoshi Ogata

Properties of carbon nitride films with composition ratio <i>C</i>/<i>N</i>=0.5–3.0 prepared by the ion and vapor deposition method

Kiyoshi Ogata, J.F.D. Chubaci, F. Fujimoto · Journal of Applied Physics · 1994 · 191 citations

Materials Science, Materials Engineering, Engineering +13

Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna

Eiji Takahashi, Yasuaki Nishigami, Atsushi Tomyo et al. · Japanese Journal of Applied Physics · 2007 · 69 citations

Engineering, Integrated Circuits, Thin Film Process Technology +16

Coating Films of Titanium Nitride Prepared by Ion and Vapor Deposition Method

Mamoru Satou, Yasunori Andoh, Kiyoshi Ogata et al. · Japanese Journal of Applied Physics · 1985 · 50 citations

Crystal Structure, Engineering, Chemical Deposition +18

Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units

Hiroshige Deguchi, Hitoshi Yoneda, Kenji Kato et al. · Japanese Journal of Applied Physics · 2006 · 49 citations

Plasma Diffusion, Electrical Engineering, Lia Units +10

X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering

Masao Matsuoka, Sadao Isotani, Ronaldo Domingues Mansano et al. · World Journal of Nano Science and Engineering · 2012 · 42 citations · Full text

Engineering, Cubic Boron Nitride, Graphite Target +20