Masatoshi Wakagi

Change in crystalline morphologies of polycrystalline silicon films prepared by radio-frequency plasma-enhanced chemical vapor deposition using SiF4+H2 gas mixture at 350 °C

Toshiki Kaneko, Masatoshi Wakagi, Ken‐ichi Onisawa et al. · Applied Physics Letters · 1994 · 127 citations

Materials Science, Engineering, Crystalline Morphologies +11

Optical Properties of Ultrathin Crystalline and Amorphous Silicon Films

Hien V. Nguyen, Yiwei Lu, Sangbo Kim et al. · Physical Review Letters · 1995 · 71 citations

Materials Science, Semiconductors, Cluster Films +13

Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow

Toshiki Kaneko, Ken‐ichi Onisawa, Masatoshi Wakagi et al. · Japanese Journal of Applied Physics · 1993 · 61 citations

Si Films, Engineering, Chemistry +17

Ge K-Edge Extended X-Ray Absorption Fine Structure Study of the Local Structure of Amorphous GeTe and the Crystallization

Yoshihito Maeda, Masatoshi Wakagi · Japanese Journal of Applied Physics · 1991 · 51 citations

X-ray Crystallography, X-ray Spectroscopy, Local Structure +17

Preparation of ultrathin microcrystalline silicon layers by atomic hydrogen etching of amorphous silicon and end-point detection by real time spectroellipsometry

Hien V. Nguyen, Ilsin An, R. W. Collins et al. · Applied Physics Letters · 1994 · 50 citations

Engineering, Atomic Hydrogen Etching, Real Time Spectroellipsometry +18