Concepedia

K. Ando

KA

Statistics

Publications

11

Citations

558

H-Index

11

Active since

1991

Affiliations

NEC (Japan)(Current)

K. Ando is an author at NEC (Japan) specializing in materials science, semiconductor interfaces, and engineering.

Publications per year

1991–2003

11

Publications

11

Mechanical stress effect of etch-stop nitride and its impact on deep submicron transistor design

Seiichi Ito, Hironao Namba, Keiko Yamaguchi et al. · 2002 · 153 citations

, , +17

Interface defects responsible for negative-bias temperature instability in plasma-nitrided SiON/Si(100) systems

Shinji Fujieda, Yoshinao Miura, Motofumi Saitoh et al. · Applied Physics Letters · 2003 · 72 citations

, , +17

Mechanism of leakage current through the nanoscale SiO2 layer

Seido Nagano, Masaru Tsukiji, K. Ando et al. · Journal of Applied Physics · 1994 · 54 citations

, , +17

Infrared studies of transition layers at SiO2/Si interface

Haruhiko Ono, Taeko Ikarashi, K. Ando et al. · Journal of Applied Physics · 1998 · 52 citations

, , +17

Bonding configurations of nitrogen absorption peak at 960 cm−1 in silicon oxynitride films

Haruhiko Ono, Taeko Ikarashi, Yoshinao Miura et al. · Applied Physics Letters · 1999 · 51 citations

, , +11

1–5 of 11