Concepedia

Taeko Ikarashi

TI

Statistics

Publications

15

Citations

417

H-Index

14

Active since

1993

Affiliations

NEC (Japan)(Current)

Taeko Ikarashi is an author at NEC (Japan) specializing in materials science, semiconductor materials, and engineering.

Publications per year

1993–2018

15

Publications

15

Dual workfunction Ni-silicide/HfSiON gate stacks by phase-controlled full-sificidation (PC-FUSI) technique for 45nm-node LSTP and LOP devices

Kazutoshi Takahashi, Kei Manabe, Taeko Ikarashi et al. · 2005 · 58 citations

Engineering, Electrical Engineering, Materials Science +16

Infrared studies of transition layers at SiO2/Si interface

Haruhiko Ono, Taeko Ikarashi, K. Ando et al. · Journal of Applied Physics · 1998 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +17

Bonding configurations of nitrogen absorption peak at 960 cm−1 in silicon oxynitride films

Haruhiko Ono, Taeko Ikarashi, Yoshinao Miura et al. · Applied Physics Letters · 1999 · 51 citations

Natural Sciences, Materials Science, Physics +11

Facet formation mechanism of silicon selective epitaxial layer by Si ultrahigh vacuum chemical vapor deposition

Tohru Aoyama, Taeko Ikarashi, Keiko Miyanaga et al. · Journal of Crystal Growth · 1994 · 48 citations

Engineering, Materials Engineering, Materials Science +14

High mobility MISFET with low trapped charge in HfSiO films

A. Morioka, Hirohito Watanabe, Makoto Miyamura et al. · 2003 · 29 citations

Engineering, Electrical Engineering, Physics +17

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