Concepedia
Statistics
Publications
12
Citations
400
H-Index
11
Active since
1993
Affiliations
Applied Materials (United States)(Current)
University of Maryland, College Park
Samsung (South Korea)
K. Ramaswamy is an author at Applied Materials (United States) specializing in plasma physics, electrical engineering, and physics.
Publications per year
1993–2020
Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching
S. Banna, Ankur Agarwal, K. Tokashiki et al. · IEEE Transactions on Plasma Science · 2009 · 103 citations
Natural Sciences, Electrical Engineering, Physics +17
Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas
Kallol Bera, Shahid Rauf, K. Ramaswamy et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2009 · 57 citations
Control of plasma uniformity in a capacitive discharge using two very high frequency power sources
Kallol Bera, Shahid Rauf, K. Ramaswamy et al. · Journal of Applied Physics · 2009 · 55 citations
Etching with atomic precision by using low electron temperature plasma
L. Dorf, J-C Wang, Shahid Rauf et al. · Journal of Physics D Applied Physics · 2017 · 40 citations
Engineering, Electrical Engineering, Microelectronics +9
High power, high brightness electron beam generation in a pulse-line driven pseudospark discharge
W.W. Destler, Z. Segalov, John Rodgers et al. · Applied Physics Letters · 1993 · 37 citations
Natural Sciences, Electrical Engineering, Physics +15
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