M. Isobe

Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

D. M. Tennant, R. Fullowan, Hitoshi Takemura et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 16 citations

Electrical Engineering, Performance Evaluation Tests, Engineering +13

A thermally assisted field emission electron beam exposure system

H. Nakazawa, Hitoshi Takemura, M. Isobe et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 13 citations

Engineering, Electron-beam Lithography, Current Density +17

Development of nanometric electron-beam lithography system (JBX-5D II)

Michael H. Shearer, Hitoshi Takemura, M. Isobe et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 12 citations

Engineering, Electron-beam Lithography, Microscopy +18

Performance of new E-beam lithography system JBX-9300FS

Hitoshi Takemura, H. Ohki, H. Nakazawa et al. · Microelectronic Engineering · 2000 · 11 citations

Electrical Engineering, Engineering, Beam Lithography +6