Y. S. Mor

A 7nm CMOS platform technology featuring 4^th generation FinFET transistors with a 0.027um² high density 6-T SRAM cell for mobile SoC applications

Shien-Yang Wu, C.Y. Lin, M.C. Chiang et al. · 2016 · 129 citations

Engineering, Computer Engineering, Electrical Engineering +13

Effective repair to ultra-low-<i>k</i> dielectric material (<i>k</i>∼2.0) by hexamethyldisilazane treatment

Y. S. Mor, Ting‐Chang Chang, Po‐Tsun Liu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 81 citations

Natural Sciences, Materials Engineering, Materials Science +17

Enhancing the Oxygen Plasma Resistance of Low-k Methylsilsesquioxane by H₂ Plasma Treatment

Po‐Tsun Liu, Ting‐Chang Chang, Y. S. Mor et al. · Japanese Journal of Applied Physics · 1999 · 66 citations

Natural Sciences, Materials Engineering, Materials Science +16

The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by  N 2 O  Plasma Treatment

Ting‐Chang Chang, Po‐Tsun Liu, Y. S. Mor et al. · Journal of The Electrochemical Society · 1999 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +16

A 3nm CMOS FinFlex™ Platform Technology with Enhanced Power Efficiency and Performance for Mobile SoC and High Performance Computing Applications

Shien-Yang Wu, M.C. Chiang, C.Y. Lin et al. · 2022 International Electron Devices Meeting (IEDM) · 2022 · 56 citations

Engineering, Electrical Engineering, High-performance Computing +17