Y. S. Mor

A 7nm CMOS platform technology featuring 4^th generation FinFET transistors with a 0.027um² high density 6-T SRAM cell for mobile SoC applications

Shien-Yang Wu, C.Y. Lin, M.C. Chiang et al. · 2016 · 124 citations

Low-power Electronics, Electrical Engineering, Cmos Platform Technology +13

Effective repair to ultra-low-<i>k</i> dielectric material (<i>k</i>∼2.0) by hexamethyldisilazane treatment

Y. S. Mor, Ting‐Chang Chang, Po‐Tsun Liu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 81 citations

Materials Engineering, Materials Science, Chemical Engineering +13

Enhancing the Oxygen Plasma Resistance of Low-k Methylsilsesquioxane by H₂ Plasma Treatment

Po‐Tsun Liu, Ting‐Chang Chang, Y. S. Mor et al. · Japanese Journal of Applied Physics · 1999 · 66 citations

Low-k Methylsilsesquioxane, Engineering, Organic Silsesquioxane +20

The Novel Improvement of Low Dielectric Constant Methylsilsesquioxane by  N 2 O  Plasma Treatment

Ting‐Chang Chang, Po‐Tsun Liu, Y. S. Mor et al. · Journal of The Electrochemical Society · 1999 · 56 citations

Engineering, O Plasma Treatment, Plasma Treatment Time +16

Effects of H2 plasma treatment on low dielectric constant methylsilsesquioxane

Ting‐Chang Chang, Po‐Tsun Liu, Yu-Jen Mei et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 52 citations

Materials Science, Chemical Engineering, Engineering +12