Concepedia
Statistics
Publications
9
Citations
187
H-Index
Active since
1997
Affiliations
Ebara (Japan)(Current)
Toshiba (Japan)
Dai Nippon Printing (Japan)
Masahiro Hatakeyama is an author at Ebara (Japan) specializing in electron beam lithography, electron microscopy, and engineering.
Publications per year
1997–2014
Fast Atom Beam Etching of Glass Materials with Contact and Non-Contact Masks
Yasushi TOMA, Masahiro Hatakeyama, Katsunori Ichiki et al. · Japanese Journal of Applied Physics · 1997 · 35 citations
Engineering, Materials Engineering, Materials Science +15
Performance of EBeyeM for EUV mask inspection
Shinji Yamaguchi, Masato Naka, Takashi Hirano et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 29 citations
Engineering, Electrical Engineering, Instrumentation +13
Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks
Ryoichi Hirano, S. Iida, Tsuyoshi Amano et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2014 · 23 citations
Engineering, Electrical Engineering, Materials Science +17
Development of extreme ultraviolet mask pattern inspection technology using projection electron beam optics
Ryoichi Hirano, Hidehiro Watanabe, S. Iida et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 22 citations
Engineering, Manufacturing Engineering, Materials Science +17
EUV patterned mask inspection system using a projection electron microscope technique
Hidehiro Watanabe, Ryoichi Hirano, S. Iida et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 21 citations
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