Christophe Pierrat

<title>Automated optical proximity correction: a rules-based approach</title>

O.W. Otto, Joseph G. Garofalo, Kevin Low et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 81 citations

Engineering, Optic Design, Computer-aided Design +17

Positive resist image by dry etching: New dry developed positive working system for electron beam and deep ultraviolet lithography

Christophe Pierrat, S. Tedesco, F. Vinet et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 33 citations

Electrical Engineering, High Resolution, Engineering +14

Exposure characteristics of alternate aperture phase-shifting masks fabricated using a subtractive process

R. L. Kostelak, Christophe Pierrat, Joseph G. Garofalo et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 24 citations

Engineering, Electron-beam Lithography, Ophthalmology +12

Multiple-layer blank structure for phase-shifting mask fabrication

Christophe Pierrat, Theo Siegrist, John J. DeMarco et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 14 citations

Materials Science, Optical Materials, Engineering +12

PRIME process for deep UV and E-beam lithography

Christophe Pierrat, S. Tedesco, F. Vinet et al. · Microelectronic Engineering · 1990 · 12 citations

Optical Materials, Engineering, Electron-beam Lithography +6