Jérôme Vaillant

Fully Optimized Cu based process with dedicated cavity etch for 1.75μm and 1.45μm pixel pitch CMOS Image Sensors

Muriel Cohen, F. Roy, Didier Hérault et al. · 2006 · 45 citations · Full text

Electrical Engineering, Wafer Scale Processing, Engineering +13

Source follower noise limitations in CMOS active pixel sensors

Keith Findlater, Jérôme Vaillant, Donald J. Baxter et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 34 citations · Full text

Image Sensor, Engineering, Cmos Imagers +6

Impact of Blend Morphology on Interface State Recombination in Bulk Heterojunction Organic Solar Cells

Benjamin Bouthinon, R. Clerc, Jérôme Vaillant et al. · Advanced Functional Materials · 2015 · 33 citations · Full text

Interface State Recombination, Engineering, Organic Electronics +21

Uniform illumination and rigorous electromagnetic simulations applied to CMOS image sensors

Jérôme Vaillant, Axel Crocherie, Flavien Hirigoyen et al. · Optics Express · 2007 · 32 citations · Full text

Engineering, Wave Optic, Cmos Image Sensors +23

Photometric observations of a polychromatic laser guide star

Renaud Foy, Michel Tallon, I. Tallon–Bosc et al. · Journal of the Optical Society of America A · 2000 · 28 citations

Photometry, Photometric Observation, Photometric Calibration +9