Guoxiang Ning

The impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Tim Lin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 15 citations

Computing, Computational Engineering, Manufacturing Engineering +17

Generalized frequency dependence of output Stokes parameters in an optical fiber system with PMD and PDL/PDG

Hui Dong, Min Yan, Guoxiang Ning et al. · Optics Express · 2005 · 14 citations · Full text

Engineering, Electrical Engineering, Optics +16

Impact of 14-nm photomask uncertainties on computational lithography solutions

John L. Sturtevant, Edita Tejnil, Tim Lin et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 13 citations

Engineering, Computational Engineering, Manufacturing Engineering +17