Hyo‐Shin Ahn

Al‐Doped TiO₂ Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

Seong Keun Kim, Gyu‐Jin Choi, Sang‐Young Lee et al. · Advanced Materials · 2008 · 317 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Interaction and ordering of vacancy defects in NiO

Sohee Park, Hyo‐Shin Ahn, Choong‐Ki Lee et al. · Physical Review B · 2008 · 154 citations

Materials Science, Spintronics, Oxygen Vacancy +15

Effects of carbon residue in atomic layer deposited HfO2 films on their time-dependent dielectric breakdown reliability

Moonju Cho, Jeong Hwan Kim, Cheol Seong Hwang et al. · Applied Physics Letters · 2007 · 61 citations

Materials Science, Hfo2 Films, Engineering +13

Unusual stress behavior in W-incorporated hydrogenated amorphous carbon films

Aiying Wang, Hyo‐Shin Ahn, Kwang‐Ryeol Lee et al. · Applied Physics Letters · 2005 · 47 citations

Materials Science, Tungsten Concentration, Engineering +9

Field emission of doped carbon nanotubes

Hyo‐Shin Ahn, Kwang‐Ryeol Lee, Doh-Yeon Kim et al. · Applied Physics Letters · 2006 · 45 citations

Electrical Engineering, Boron Nitride, Engineering +13