Concepedia

Guangming Xiao

GX

Statistics

Publications

11

Citations

222

H-Index

10

Active since

2005

Affiliations

Luminex (United States)(Current)

Samsung (South Korea)

Guangming Xiao is an author at Luminex (United States) specializing in mask design, engineering, and inverse lithography technology.

Publications per year

2005–2017

11

Publications

11

Trade-off between inverse lithography mask complexity and lithographic performance

Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Linyong Pang, Guangming Xiao, Vikram Tolani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 34 citations

Engineering, Computer Engineering, Design Optimization +13

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Linyong Pang, Peter Hu, Danping Peng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +7

ILT optimization of EUV masks for sub-7nm lithography

Kevin Hooker, Kevin Lucas, Bernd Küchler et al. · 2017 · 18 citations

Engineering, Electrical Engineering, Manufacturing Engineering +10

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyunjong Lee et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Engineering, Design, Design Computation +13

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