Vikram Tolani

Trade-off between inverse lithography mask complexity and lithographic performance

Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

Toward a consistent and accurate approach to modeling projection optics

Danping Peng, Peter Hu, Vikram Tolani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 43 citations

Natural Sciences, Computational Engineering, Digital Imaging +8

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Linyong Pang, Guangming Xiao, Vikram Tolani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 34 citations

Engineering, Computer Engineering, Design Optimization +13

Source-mask co-optimization (SMO) using level set methods

Vikram Tolani, Peter Hu, Danping Peng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 23 citations

Computing, Computer Science, Algorithms +10

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Linyong Pang, Peter Hu, Danping Peng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +7