W.X. Lu

Pre-amorphization damage in ion-implanted silicon

R.J. Schreutelkamp, J. S. Custer, J.R. Liefting et al. · Materials Science Reports · 1991 · 135 citations

Engineering, Materials Engineering, Materials Science +14

Reduction of secondary defect formation in MeV B+ ion-implanted Si (100)

W.X. Lu, Yiming Qian, Ruoming Tian et al. · Applied Physics Letters · 1989 · 36 citations

Engineering, Materials Engineering, Materials Science +17

Range straggling of MeV ions in amorphous silicon: Discrepancies with TRIM

R.J. Schreutelkamp, J.R. Liefting, P. M. Zagwijn et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1990 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +13

The role of extended defects on transient boron diffusion in ion-implanted silicon

R.J. Schreutelkamp, J. S. Custer, V. Raineri et al. · Materials Science and Engineering B · 1992 · 17 citations

Engineering, Materials Engineering, Materials Science +16