Ying Zhang

Extension and source/drain design for high-performance finFET devices

J. Kedzierski, M. Ieong, E. Nowak et al. · IEEE Transactions on Electron Devices · 2003 · 244 citations

Low-power Electronics, Extension Implants, Electrical Engineering +14

Extreme scaling with ultra-thin Si channel MOSFETs

B. Doris, M. Ieong, T. Kanarsky et al. · 2003 · 181 citations

Electrical Engineering, Engineering, Technology Scaling +8

Enhancement of hydroxide conductivity by the di-quaternization strategy for poly(ether ether ketone) based anion exchange membranes

Xuemei Wu, Wanting Chen, Xiaoming Yan et al. · Journal of Materials Chemistry A · 2014 · 85 citations

Engineering, Di-quaternization Strategy, Chemistry +22

Studies of the reactive ion etching of SiGe alloys

G. S. Oehrlein, G. M. W. Kroesen, E. de Frésart et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 48 citations · Full text

Materials Science, Materials Engineering, Ion Implantation +13

CMOS-Integrated 40GHz Germanium Waveguide Photodetector for On-chip Optical Interconnects

Solomon Assefa, Fengnian Xia, Stephen W. Bedell et al. · 2009 · 43 citations

Photonic Device, Photonics, Electrical Engineering +12