Hiroaki Niimi

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 139 citations

Engineering, Electron-beam Lithography, Finfet Technology +18

Sub- $10^{-9}~\Omega $ -cm2 n-Type Contact Resistivity for FinFET Technology

Hiroaki Niimi, Zuoguang Liu, Oleg Gluschenkov et al. · IEEE Electron Device Letters · 2016 · 58 citations

Semiconductors, Semiconductor Technology, Electrical Engineering +15

FinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloys

Oleg Gluschenkov, Z. Liu, Hiroaki Niimi et al. · 2016 · 35 citations

Engineering, Silicon On Insulator, Electronic Structure +19

Ti and NiPt/Ti liner silicide contacts for advanced technologies

Praneet Adusumilli, Emre Alptekin, M. Raymond et al. · 2016 · 31 citations

Materials Engineering, Materials Science, Electrical Engineering +15

Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability

Zuoguang Liu, Oleg Gluschenkov, Hiroaki Niimi et al. · 2017 · 11 citations

Contact Resistance Reduction, Engineering, Vlsi Design +21