Blandine Minghetti

Fully-depleted SOI technology using high-k and single-metal gate for 32 nm node LSTP applications featuring 0.179 μm² 6T-SRAM bitcell

C. Fenouillet-Béranger, J. Todeschini, Jean-Christophe Le-Denmat et al. · 2007 · 61 citations

Pmos Transistors, Semiconductor Technology, Electrical Engineering +13

A Cost-Effective Low Power Platform for the 45-nm Technology Node

E. Josse, S. Parihar, Olivier Callen et al. · 2006 · 33 citations

Engineering, Vlsi Design, Integrated Circuits +19

Transitioning of direct e-beam write technology from research and development into production flow

L. Pain, B. Icard, S. Manakli et al. · Microelectronic Engineering · 2006 · 16 citations

Industrial Design, Engineering, Microfabrication +10

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)

L. Pain, M. Jurdit, J. Todeschini et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 14 citations

Engineering, Electron-beam Lithography, Computer Architecture +21

Lens heating challenges for negative tone develop layers with freeform illumination: a comparative study of experimental vs. simulated results

Scott Halle, Michael Crouse, Aiqin Jiang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 12 citations

Optical Materials, Engineering, Optic Design +18