John G. Maltabes

<title>Airborne chemical contamination of a chemically amplified resist</title>

Scott A. MacDonald, Nicholas J. Clecak, Hartmut Wendt et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 91 citations

Engineering, Air Quality, Exposure Assessment +19

1X deep-UV lithography with chemical amplification for 1-micron DRAM production

John G. Maltabes, Steven J. Holmes, James R. Morrow et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1990 · 33 citations

Engineering, Electron-beam Lithography, Dram Chips +16

Defect reduction progress in step and flash imprint lithography

K. Selenidis, John G. Maltabes, Ian McMackin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 32 citations

Engineering, Electron-beam Lithography, Integrated Circuits +19

Advances in roll-to-roll imprint lithography for display applications

Albert Jeans, Marcia Almanza‐Workman, Robert Cobene et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 28 citations

Materials Science, Electrical Engineering, Roll-to-roll Imprint Lithography +13

32 nm imprint masks using variable shape beam pattern generators

Kosta Selinidis, Ecron Thompson, Gerard M. Schmid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 25 citations