Nicholas J. Clecak - Concepedia

Author

Nicholas J. Clecak

IBM (United States)

Also Known As

N. Clecak, N. J. CLECAK, N. J. Clecak, N.J. Clecak, Nicholas Clecak, Nicholas J. CLECAK, Nicholas J. Clecak

Publications

680

Citations

H-Index

Concepts

All Affiliations

IBM (United States)IBM Research - Almaden

About

Nicholas J. Clecak is an author at IBM (United States) specializing in engineering, chemistry, and chemical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	18	539
2	Applied Physics	5	5	84
3	Natural Sciences	2	2	112
4	Health Sciences	1	1	91
5	Management	1	1	11

Nicholas J. Clecak

Publications

619

Citations

H-Index

Page 1

	Year	Citations
An Explanation of the Electrochromism of Lutetium Diphthalocyanine G. A. Corker, Barbara Grant, Nicholas J. Clecak Journal of The Electrochemical Society Excited State PropertyChemical EngineeringEngineeringOrganic ElectrochemistryPhotochemistry	1979	100
<title>Airborne chemical contamination of a chemically amplified resist</title> Scott A. MacDonald, Nicholas J. Clecak, Hartmut Wendt, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringAir QualityExposure AssessmentChemistryEnvironmental Chemistry	1991	91
Airborne contamination of a chemically amplified resist. 1. Identification of problem Scott Macdonald, William D. Hinsberg, H. Russell Wendt, Chemistry of Materials Environmental MonitoringEngineeringAir QualityAltmetric Attention ScoreExposure Assessment	1993	48
Deep UV photoresists I. Meldrum's diazo sensitizer Barbara Grant, Nicholas J. Clecak, Robert J. Twieg, IEEE Transactions on Electron Devices Remarkable Dissolution KineticsChemical EngineeringPhotochemistryOphthalmologyChemical Image	1981	39
Novel Liquid Crystalline Materials: Synthesis and preliminary characterization of new 4,4′-disubstituted diphenyldiacetylene, tolane and stilbene derivatives Barbara Grant, Nicholas J. Clecak, Robert J. Cox Molecular crystals and liquid crystals Materials ScienceOrganic Material ChemistrySeveral New SeriesStilbene DerivativesDerivatives	1979	39
Polysilanes: Photochemistry and deep UV lithography R. Miller, G. M. Wallraff, Nicholas J. Clecak, Polymer Engineering and Science Optical MaterialsEngineeringResponsive PolymersPolysilane CopolymersProjection Printer	1989	35
1X deep-UV lithography with chemical amplification for 1-micron DRAM production John G. Maltabes, Steven J. Holmes, James R. Morrow, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyDram ChipsPe 500Micro-optical Component	1990	33
Plasma developable photoresist systems based on chemical amplification Scott Macdonald, Hubert Schlosser, Hiroshi Itô, Chemistry of Materials Chemical EngineeringChemical AmplificationEngineeringChemical MeasurementPhotochemistry	1991	31
Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate William D. Hinsberg, Scott A. MacDonald, Nicholas J. Clecak, Chemistry of Materials EngineeringAir QualityAltmetric Attention ScoreExposure AssessmentChemical Pollutant	1994	26
Approach toward environmental stabilization of chemical amplification resists. Hiroshi Ito, William P. England, Ratnam Sooriyakumaran, Journal of Photopolymer Science and Technology	1993	19

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