David A. Mixon

<title>Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography</title>

Omkaram Nalamasu, Elsa Reichmanis, May Cheng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 22 citations

Amplified Resist Formulation, Engineering, Electron-beam Lithography +23

A versatile low-pressure ozone source

E. Coleman, Theo Siegrist, David A. Mixon et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 22 citations

Materials Science, Engineering, Atmospheric Photochemistry +15

Growth of YBa2Cu3O7−δ in pure ozone irradiated with ultraviolet light

Theo Siegrist, David A. Mixon, E. Coleman et al. · Applied Physics Letters · 1992 · 19 citations

Materials Science, Chemical Engineering, Engineering +12

A systematic approach to improving quality: a framework and a field study

Andrew J. Czuchry, Carroll Hyder, Mahmoud M. Yasin et al. · International Journal of Quality & Reliability Management · 1997 · 16 citations

Total Quality Management, Customer Satisfaction, Engineering +22

Revolutionary and evolutionary resist design concepts for 193 nm lithography

O. Nalamasu, Tom Wallow, Elsa Reichmanis et al. · Microelectronic Engineering · 1997 · 11 citations

Materials Science, Engineering, Specific Resistance +9