Concepedia

May Cheng

MC

2

Publications

48

Citations

2

H-Index

1991

Active since

Affiliations

AT&T (United States)(Current)

Nokia (United States)

May Cheng is an author at AT&T (United States) specializing in applied physics, organic electronics, and chemical engineering.

Top concepts

ChemistryEngineeringPhotovoltaicsPhotochemistryApplied PhysicsOptoelectronicsSurface ScienceMaterial ScienceMicrofabricationOrganic Electronics

Publications per year

1991–1991

2

Publications

2

An overview of resist processing for deep-UV lithography.

Omkaram Nalamasu, May Cheng, Allen G. Timko et al. · Journal of Photopolymer Science and Technology · 1991 · 26 citations · Full text

<title>Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography</title>

Omkaram Nalamasu, Elsa Reichmanis, May Cheng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 22 citations

Amplified Resist Formulation, Engineering, Electron-beam Lithography +23

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